Laurence Marchini, Editor, writes:
We see from your search that you're looking for information on the term "DFM (design for manufacture)",
and we have a large number of manufacturers' news releases and technical articles here on Electronicstalk which will be of interest.
Let me be your guide.
Start with
the news release Reference flow incorporates power reduction system from
Cadence Design Systems, which we summarised at the time by saying "The Pride V1.5 flow incorporates the CPF-based Cadence low-power design solution to provide an automated and holistic low-power design flow from RTL design through GDS II
tape-out".
A few weeks before,
we featured the news release DC/DC convertors move to the surface from
Ericsson Power Modules: "Ericsson's DfM process has made it possible to develop surface-mount modules that comply with even the most demanding manufacturing processes".
In November 2007, we covered the news from Zuken
concerning its DFM Center
- take a look at PCB software centres on design for manufacturing
which says: "Manufacturing design solution helps board producers to handle the increasing complexity and diversity of today's PCBs".
Take a look also at the news release from Synopsys, Reference design flow eases chip evaluation,
as well as Medical project moves on to manufacturing from Plexus Corp UK,
and Auto router optimises yield from Pyxis Technology.
See also:
IC platform cuts design times
(September 2007)
Cadence's new approach directly models critical elements of the manufacturing process instead of relying on conservative design rules
News on the Control Center automated DFM from Direct Logix
(September 2007)
Automated Design for Manufacturing (DFM) allows PCB designers to receive manufacturing design feedback within one hour
Software speeds foundry operations
(August 2007)
The NanoScope platform presents a major technology and industry breakthrough in speed and accuracy, using distributed computing on generic network computers
Design company announces new acquisition
(August 2007)
Cadence is now the only EDA company that can deliver manufacturing awareness and lithographic correctness for all layers in an IC
Reconfigurable logic IP optimised for 65 and 45nm
(July 2007)
Manufacturability-optimised reconfigurable logic intellectual property brings significant benefits to customers designing in advanced geometries
Pattern-synthesis technology acquired
(July 2007)
Invarium's pattern synthesis capabilities enable superior pattern resolution and faster yield ramp for designs targeted to 45nm process technologies and below
PCB design bureau expands DFM checking
(July 2007)
Freedom CAD has standardised on Valor Enterprise 3000 to perform over 700 design for manufacturability verification checks on every design
News on the Blaze DFM from Softjin Technologies
(July 2007)
Software component development and licensing business model proves crucial for bringing quality DFM software to market faster
Measurement link aids optical proximity correction
(June 2007)
Design for manufacturing interface helps customers to develop faster, more accurate and predictive OPC models for advanced 45nm and beyond technologies
Acquisition delivers powerful design-to-fab flow
(June 2007)
Mentor Graphics Corp has acquired Sierra Design Automation for US $90 million in cash and stock
Design platforms go with TSMC's flow
(June 2007)
Synopsys is supporting the new TSMC Reference Flow 8.0 in its Galaxy Design Platform, Discovery Verification Platform and design for manufacturing (DFM) products
Reference flow supports 45nm process technology
(June 2007)
Design methodology increases yields, lowers risks and improves design margins
Infineon and Chartered use litho-friendly design
(May 2007)
Mentor Graphics has validated its Calibre LFD (litho-friendly design) results in silicon on 65nm process technology
EDA tool stands test of comparison
(May 2007)
Tool can compare any two layout and/or mask databases, which may be in different formats, have different hierarchies or come from different sources
Collaboration on e-beam pattern inspection tools
(April 2007)
Companies are collaborating to enable faster, more accurate, more predictive optical proximity correction (OPC) model building for e-beam manufacturing at 45nm and beyond
Companies combine to make masks accessible to test
(April 2007)
Two companies collaborating on making masks easier to test
EDA companies combine to improve mask consistency
(April 2007)
A specialist in variability-aware analysis, and a provider of mask-reconfigurable technology, are to combine their expertise to reduce litho-related and stress-related variability in masks
Foundry offers support services for 45nm process
(April 2007)
A full range of design support services for foundry's 45nm process includes prototyping
Electronics company wins creativity award
(April 2007)
Clear Shape Technologies has received the EE Times Annual Creativity in Electronics (ACE) Award for Design Team of the Year for its OutPerform design team
Direct translations between Open Access and Oasis
(April 2007)
A customised EDA (Electronic Design Automation) tool development company performs direct bi-directional translations between OpenAccess and OASIS files
Nanno-WiN and Nanno-CaL link to Windows
(April 2007)
Ssoftware products, Nanno-WiN and Nanno-CaL, now interface to the Windows-based design environment from MyCAD as well as run on workstations running Unix or Sun OS
Design software reduces turnaround time
(March 2007)
High-speed complex chips use software to boost performance and optimise all timing modes concurrently
Variability analysis software on award shortlist
(March 2007)
Variability platform products have been nominated for three EDA industry awards
Second round of funding for DFM pioneer
(March 2007)
A company specialising in electrical design for manufacturability (DFM) has closed its Series B round of funding for $10 million and completed a corporate merger
News on the Merger of DFM companies from Blaze DFM
(March 2007)
Two of the leading providers of design for manufacturability (DFM) software systems are to merge to provide a comprehensive electrical DFM system
EDA tools work with OpenAccess
(March 2007)
Nanno Solutions has joined the Silicon Integration Initiative, and that its software will join other EDA tools that work with the OpenAccess database
Yeshurun and Curren to address conferences
(February 2007)
Sondrel personnel will speak at Magma's Music Silicon Valley user conference and the IET and FSA International Semiconductor Forum
Sherwani joins technical advisory board
(February 2007)
Dr Naveed Sherwani, cofounder, President and CEO of fabless ASIC company Open-Silicon, has joined Pyxis' Technical Advisory Board (TAB)
Compiler improves timing on large ASIC blocks
(January 2007)
Renesas Technology Corp has adopted Cadence Encounter RTL Compiler with advanced global synthesis in its ASIC design kits and methodologies for 90nm and below
STARC signs for leakage power optimisation
(January 2007)
Blaze DFM has been chosen by STARC to provide leakage power optimisation software that will be integrated into the STARCAD-CEL reference design methodology
Design centre taps San Diego's DFM talent pool
(January 2007)
Blaze DFM has opened a development and support centre in San Diego, California, managed by Dr Cho Moon
Rochel to engineer momentum
(January 2007)
Dr Steffen Rochel has joined Blaze DFM as Vice President of Engineering
Alliance targets variability-aware DFM flow
(January 2007)
Clear Shape Technologies works with Japan's leading semiconductor technology research organisation to jointly develop, validate and deploy a variability-aware DFM flow
PVS rule files now for 180nm technology
(December 2006)
Synopsys' Hercules Physical Verification Suite (PVS) rule files are now available for Tower Semiconductor's release of 180nm high-voltage technology