Laurence Marchini, Editor, writes:
We see from your search that you're looking for information on the term "Patterning",
and we have a large number of manufacturers' news releases and technical articles here on Electronicstalk which will be of interest.
Let me be your guide.
Start with
the news release Research agreement targets sub-32nm memory from
IMEC, which we summarised at the time by saying "PSC will collaborate with IMEC's advanced lithography program addressing immersion, double patterning and EUV lithography challenges".
A few weeks before,
we featured the news release Mixed-signal process runs on 32nm node from
TSMC: "Leading edge technology is optimised for low power, high density and manufacturing margins with optimal process complexity and cost management".
In August 2007, we covered the news from Powerlase
concerning its Starlase AO8
- take a look at Top power lasers to ramp up plasma production
which says: "The introduction of the Powerlase laser systems has significantly altered flat-panel production methods".
Take a look also at the news release from Cadence Design Systems, Pattern-synthesis technology acquired,
as well as Tutorial to explain laser patterning processes from UK Displays and Lighting Network,
and Shrinking life cycles good for e-beam lithography from Vistec Electron Beam.
See also:
ILT promises many benefits over old technology
(March 2007)
Inverse Lithography Technology techniques surpass previous technical stalwarts such as optical proximity correction
UK-Korea forum leads to laser business
(January 2007)
In 2002 Powerlase's Sales Manager Duncan Cooper presented at the Global Watch Service-led UK-Korea High Tech Industry Forum in Seoul, and was introduced to several Korean manufacturers
EU project realises nano-imprinting stepper
(December 2006)
VTT Technical Research Centre of Finland and SUSS MicroTec have developed an advanced nano-imprinting stepper
Imaging, overlay and throughput improvements
(December 2006)
ASML Holding has introduced its newest Twinscan system, an advanced 193-nanometer (nm) exposure system which features imaging, overlay and throughput improvements
Patterned filters cover wide range of wavelengths
(November 2006)
Deposition Sciences has announced an innovation in dichroic filters coating-deposition capabilities
193nm immersion lithography research extended
(July 2006)
IMEC shifts lithography program towards hyper-NA immersion, double-patterning immersion and EUV
Ready for the 32nm technology node
(July 2006)
Vistec Electron Beam has two new orders in hand for advanced electron optical columns of the SB3050 variable shaped beam system
Inkjet printers to raise OLED resolution
(June 2006)
CDT and Litrex are paving the way for the production of a new generation of high-resolution P-OLEDs through the development of an inkjet printing solution capable of 200pixel/in printing
E-beam system prepares for 32nm technology
(April 2006)
A high-performance variable shaped electron beam system enables direct patterning for the 32nm technology node for R and D and prototyping
Power inductors slim down to fit latest fashions
(February 2006)
At just 0.8mm thick, the TFC3008 series of high-performance power inductors answer the demands of slimline electronic devices
Quasicrystal structures boost LED performance
(February 2006)
Photonic crystal development company Mesophotonics has set up an independent design and licensing service for LED manufacturers
Metallisation for flexible and rigid substrates
(December 2005)
Following a highly successful event in December 2004, the UK Displays Network is organising a second seminar covering metallisation and patterning of flexible and rigid substrates
Novel transistor overcomes vertical challenges
(December 2005)
A breakthrough transistor structure overcomes many of the design and manufacturing challenges associated with vertical multigate devices
Photosensitive epoxy creates optical waveguides
(May 2005)
A novel photosensitive epoxy material can be used for optical waveguides
Small claims for novel SRAM cell
(December 2004)
IMEC recons it has achieved the smallest triple-gate device SRAM cell reported to date
Guide to custom thin film circuits
(December 2003)
The new 'Micrometrics thin film design guide' is a handy engineering guide for ordering custom thin film circuits
DTI grant boosts LEP research
(March 2003)
Cambridge Display Technology has received a Department of Trade and Industry grant for a collaborative project with the National Physical Laboratory and Sheffield University
Optical system has designs on thin films and OLEDs
(October 2002)
NanoVia has developed an optical system design targeting the high-volume manufacture of OLED display devices
Imprint patterning creates higher density PCBs
(April 2002)
Tecan and Dimensional Circuits have received a prestigious innovation award from the US Institute of Printed Circuits for their work on a revolutionary new high-density circuit fabrication technology
Website addresses custom thin film circuits
(March 2002)
Micrometrics has launched a quick-find website for engineers seeking assistance with custom thin film circuits