Scanner brings new resolution to KrF technology

KrF lithography system is claimed to significantly reduce operating costs by covering resolutions that previously required more expensive ArF technology.

ASML Holding has come up with a new KrF lithography system that is claimed to significantly reduce operating costs for its customers.

The ASML Twinscan XT:1000 scanner extends cost efficient KrF technology to resolutions that previously required more expensive ArF technology.

Customers can realise savings of 30% or more per layer as a result of lower operating costs for KrF technology, particularly from cheaper lasers and lower materials cost such as KrF resists.

Today KrF systems account for about 35% of the total semiconductor lithography market (units).

By introducing the XT:1000 ASML shows its commitment to cost-effective production systems.

The XT:1000 provides benefits for both logic and memory manufacturers.

The XT:1000's high numerical aperture (NA) of 0.93 can resolve 80nm device features - far smaller than the 100nm of today's KrF systems.

The XT:1000 also improves value for customers, with an increased throughput of 165 x 300mm wafers per hour under volume manufacturing conditions while maintaining the same industry-leading 6nm overlay as leading edge ArF systems.

"ASML understands that lithography needs to be cost-effective as well as technologically advanced", says Martin van den Brink, Executive Vice President Marketing and Technology at ASML.

"Our goal is to reduce our customers' cost per wafer".

"The XT:1000 allows them to produce chips with less costly KrF tools, even as they shrink their devices".

ASML expects to begin shipping the XT:1000 by mid 2008.

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