Product category:
IC and Hybrid Processing Equipment
News Release from: Heidelberg Instruments
Edited by the Electronicstalk Editorial
Team on 25 November 2005
Chinese researchers adopt maskless
lithography
Nankai University Centre for Optics Research, located in Tianjin, China, has purchased a DWL66 maskless lithography system from Heidelberg Instruments.
Nankai University Centre for Optics Research, located in Tianjin, China, has purchased a DWL66 maskless lithography system from Heidelberg Instruments The DWL66 is a unique, maskless lithography system for mask making and direct writing
The system is capable of producing patterns down to 0.6um, and is equipped with the capability of thick resist and grey scale exposure, in addition to metrology, front to backside and layer to layer alignment.
"DWL66 systems continue to be a leading laser lithography solution among the research institutions and we are very pleased that Nankai University selected our DWL66 maskless lithography system for their projects in micro optics".
Alexander Forozan, Vice President of World Wide Sales and Marketing, Heidelberg Instruments.
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