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News Release from: Hitachi High-Technologies (Electron Microscopy) | Subject: S-4700 field emission SEM
Edited by the Electronicstalk Editorial
Team on 28 January 2002
SEM gets a better image
Hitachi High-Technologies has made a number of improvements to its S-4700 field emission SEM, which give significantly better image quality, particularly at low accelerating voltages.
Hitachi High-Technologies has made a number of improvements to its S-4700 field emission SEM, which give significantly better image quality, particularly at low accelerating voltages These include the introduction of a new snorkel objective lens and a new TTL (through-the-lens) detection system The new lens has been designed using the latest electron optical theory and allows a guaranteed resolution of just 2.1nm to be obtained at an accelerating voltage of 1 kV
This article was originally published on Electronicstalk on 16 Apr 2002 at 8.00am (UK)
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Additional detector brings enhanced imaging
The ultra-high-resolution in-lens S-5200 FESEM from Hitachi High-Technologies has been enhanced with an optional electron detector for imaging backscattered electrons at low accelerating voltages.
Resolution of 1.5nm at 15 kV and 12mm working distance (the X-ray analysis position) is retained with the new lens.
The new TTL detection system not only provides ultra-high-resolution performance using E x B energy filtered secondary electrons (SE), but also allows mixing of SE and BSE (backscattered electrons) using a retarding/accelerating plate.
This eliminates charging problems and allows imaging of atomic number contrast of any sample at low accelerating voltages.
Examples of the ultra-high resolution imaging are shown in a new brochure for the S-4700, together with the imaging capabilities provided by the new E X B filter electron detector.
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