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Product category: Stand-Alone Instruments
News Release from: Hitachi High-Technologies (Electron Microscopy) | Subject: S-4300SE/N
Edited by the Electronicstalk Editorial Team on 11 July 2003

Scope for ultra-high resolution

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The S-4300SE/N field emission variable pressure scanning electron microscope combines the high resolution and image quality of a field emission source with variable pressure operation.

The S-4300SE/N field emission variable pressure scanning electron microscope (FEVPSEM) combines the high resolution and image quality of a field emission source with the versatility of variable pressure operation to handle difficult samples The new microscope has a pressure operating range of 10-1000Pa, which means that it can be used to examine an even wider range of wet, oily or non-conducting samples than many VPSEMs

These types of samples cannot be easily imaged at all in conventional SEMs without using specialised sample preparation techniques.

The thermal Schottky emission electron source offers high brightness and excellent resolution over a wide range of accelerating voltages.

High resolution can be achieved in both high pressure and high vacuum modes, using a variety of detectors such as secondary electron, backscattered electron and Hitachi's optional environmental secondary electron detector (ESED).

The exceptional long-term beam stability of the S-4300SE/N makes it ideally suited to elemental analysis.

The microscope is fully compatible with energy dispersive X-ray (EDX) spectrometers and the latest parallel beam spectrometers (PBS) which give increased elemental sensitivity, especially for light elements.

Samples up to 160mm diameter can be accommodated in the large specimen chamber and there is a choice of two five-axis stages with eucentric tilt.

The larger stage has 100mm x movement and 50mm y movement and 360-degree rotation, together with comprehensive z and tilt capabilities.

The S-4300SE/N has extensive automated features, including autofocus, autostigmator, autobrightness and autocontrast.

Images are acquired digitally and image processing and image management systems are incorporated in the instrument.

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