Research fab to aim below 45nm

IMEC is to build a new 300mm clean room.

IMEC is to build a new 300mm clean room.

Construction of the new 2200m2 research fab will begin in February 2003, with completion due in approximately 18 months.

The facility is expected to go online in mid 2005, with activities gradually ramping up.

The initiative involves an investment of Eur 84 million, of which Eur 37.184 million has been granted by local government.

The new fab will be located adjacent to IMEC's existing facilities to ensure and optimise the exchange of information and to share common facilities, infrastructure and metrology tools.

IMEC will set up several research programmes targeting the most important issues identified by the international technology roadmap for semiconductors for the sub-45nm node.

The focus will be on EUV lithography, new materials, advanced devices and innovative interconnect schemes.

The programmes will be open for semiconductor companies and material and equipment suppliers worldwide.

"We've received very strong signals from the industry worldwide that they wish to continue collaboration with IMEC in pioneering research for the 300mm era", said Prof Gilbert Declerck, President and CEO of IMEC.

"This 300mm research facility will allow us to fulfil the requests by the industry to perform world-class research on the most advanced process steps, materials and devices for the sub-45nm node and around, above and beside CMOS".

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