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Product category: Design and Development Software
News Release from: Mentor Graphics UK
Edited by the Electronicstalk Editorial Team on 26 March 2001

STMicroelectronics goes for
subwavelength Calibre

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STMicroelectronics (ST) has adopted the Calibre tools from Mentor Graphics as its resolution enhancement solution for subwavelength semiconductor processes.

STMicroelectronics (ST) has adopted the Calibre tools as its resolution enhancement solution for subwavelength semiconductor processes ST will be using Calibre's advanced model-based optical and process correction (OPC) technology in its production flow for process technologies at 0.12 micron and below

Calibre's OPC solution (Calibre OPCpro, Calibre MT-OPCpro, Calibre Workbench, Calibre ORC and Calibre PRINTimage) provides full-chip batch correction and verification of the input layout to increase yield and process latitude.

The OPC software makes changes to the layout to pre-compensate for lithography distortions inherent in subwavelength manufacturing processes.

Any mix of rule- or simulation-based correction can be used.

The model-based OPC simulation employs an advanced empirical model of the process on top of rigorous optical simulation, and takes into account the complexities of mask-making, optical effects, resist and etch.

"OPC represents a significant expansion of our existing work with ST on physical verification", said Joseph Sawicki, general manager of the Calibre business unit of Mentor Graphics.

"Their adoption of the Calibre OPC tools further demonstrates the growing demand for a complete, integrated subwavelength tool suite".

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