Product category:
Design and Development Software
News Release from: Mentor Graphics UK
Edited by the Electronicstalk Editorial
Team on 13 February 2002
Oki standardises on Calibre for fine
geometries
Oki Semiconductor has standardised on Mentor's Calibre physical verification tool for designs in advanced process technologies of 0.35, 0.25, 0.22 and 0.16 micron.
Oki Semiconductor has standardised on Mentor's Calibre physical verification tool for designs in advanced process technologies of 0.35, 0.25, 0.22 and 0.16 micron Oki chose Calibre because previous physical verification tools proved inadequate for the multi-million-gate integrated circuits that Oki designs and markets for telecommunications, network, automotive, computer and consumer products
This article was originally published on Electronicstalk on 21 Feb 2001 at 8.00am (UK)
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"Without Calibre, we were unable to properly verify designs with more than a million gates", said Jamshed Qamar, vice president, ASIC business development for Oki Semiconductor.
"Calibre offers speed, capacity and ease of use with our advanced technologies.
It also allows us to compete more effectively with other leading manufacturers in this market segment".
Calibre can handle large designs faster than any other tool using its hierarchical polygon processing engine and concurrent rule processing.
Oki realised significant performance gains per CPU per run with Calibre: texfold improvement with the Calibre DRC tool and fivefold improvement with the Calibre LVS tool over previous tools.
In some cases, physical verification turn-around time was reduced from 30h to less than 3h.
Design problems were solved in a single run.
This savings in time and resources has given Oki the ability to complete as many as 50 large designs per year.
"We recognise that full-chip verification is still the bottleneck to tape-out", said Joseph Sawicki, general manager, Mentor Graphics Physical Verification Division.
"That is why we work to continually tune the Calibre engine, consistently achieving total runtime improvements year to year".
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