Product category:
Design and Development Software
News Release from: Mentor Graphics UK | Subject: Calibre 2004.3
Edited by the Electronicstalk Editorial
Team on 17 September 2004
Software supports new compact data
format
The Mentor Graphics Calibre product line now accepts Oasis files and supports Oasis output.
The Mentor Graphics Calibre product line now accepts Oasis files and supports Oasis output The new 2004.3 production release includes a GDS-to-Oasis translator, which was previously made publicly available for validation and verification of the new format
This article was originally published on Electronicstalk on 21 Feb 2001 at 8.00am (UK)
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Beta test partners, selected from among the world's major semiconductor developers, foundries and mask manufacturers, translated thousands of files, proving overall flow efficiency and confirming a file size reduction of 10x to 50x.
To date, Mentor has provided more than 160 downloads of the GDS-to-Oasis translation utility, which is available free of charge from the Mentor website, and is generally used as a reference for Oasis-related development activities in the industry.
Now that the tool is production proven, the Oasis translator will be an included feature in the Calibre releases, available to all Calibre customers.
"We delivered on a new technology that not only benefits the Calibre customers but the industry as a whole", said Joe Sawicki, Vice President and General Manager, Design to Silicon Division, Mentor Graphics.
"With Oasis we now have a platform enabling us to put in place a robust, value-added connection between design and manufacturing".
Oasis was created in response to the need for more efficient handling of growing data volumes and is designed to replace the current GDS format.
This new encapsulated format offers substantial improvements in data volume efficiency, up to 50x reduction in hierarchical data volume compared with GDSII, and 2x and more reduction in flat data volume compared to mask writing formats.
Oasis is expected to become the new standard for data exchange between design teams, wafer manufacturers and mask suppliers, offering a new bandwidth in information exchange along with the most efficient data representation.
Oasis will be a crucial link in future design-for-manufacture applications.
Mentor Graphics was involved in the development of Oasis from the inception, donating the initial framework of the specification, serving for many months as editor of the draft specification, then developing and contributing the translator utility.
Mentor's engineers have published several research papers on Oasis; papers can be downloaded from the Mentor website.
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