Mask data toolsuite cuts files down to size

Edited by the Electronicstalk editorial team Feb 20, 2006

TheCalibre MDP mask data preparation toolsuite has been qualified for production at leading IDMs for the 45nm process technology in flows based on OASIS, the next generation stream format.

The Mentor Graphics Calibre MDP mask data preparation toolsuite has been qualified for production at leading integrated device manufacturers (IDMs) for the 45nm process technology in flows based on OASIS, the next generation stream format.

This ensures the IDMs' ability to efficiently manage the large data files needed to create a mask for integrated circuit production.

Calibre MDP was developed in response to the data explosion that occurred beginning with the 180nm node when IC production entered the deep submicron, or subwavelength era.

At that time, it became mandatory for semiconductor manufacturers to apply resolution enhancement techniques to designs in order to achieve successful silicon.

The resulting data files, which are "flattened" to accommodate the mask writer format specification, became so large that run times for mask writing lengthened to several days or weeks.

This created a bottleneck that substantially increased costs and threatened the ability to meet the market window.

Calibre MDP reduces the bottleneck and cuts turnaround time by reducing the size of data files, enhancing the performance and capacity of tools in the flow, unifying geometry processing and increasing processing efficiency.

It supports all mask writer formats: MEBES, JEOL, Toshiba/NuFlare, Hitachi and Micronic.

Calibre's mask data preparation suite is an integrated part of the market-leading Calibre design-to-silicon platform that includes solutions for physical verification, parasitic extraction, design-for-manufacturing, and resolution enhancement.

The Calibre platform is ready and proven for the 45nm node.

The Calibre mask synthesis flow will be demonstrated in the Mentor Graphics booth (313) at the 2006 SPIE Microlithography conference, which takes place at the San Jose Convention Centre until 24th February.

Calibre OPCverify, the new advanced optical process correction verification solution, will also be demonstrated.