Product category:
Design and Development Software
News Release from: Mentor Graphics UK | Subject: Calibre nmDRC
Edited by the Electronicstalk Editorial
Team on 28 July 2006
Mentor Graphics Calibre nmDRC adopted by
UMC
Mentor Graphics Calibre nmDRC adopted by UMC to address shifting requirements for sign-off
to Address Shifting Requirements for Sign-off Mentor Graphics Corporation today announced that UMC, a leading global semiconductor foundry, has adopted the Calibre nmDRC for its next generation process technology Calibre DRC has long been a standard sign-off tool for physical verification at UMC
This article was originally published on Electronicstalk on 12 Jul 2006 at 8.00am (UK)
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Calibre nmDRC redefines traditional design rule checking by dramatically reducing total cycle time and integrating critical elements such as critical area analysis and critical feature identification.
Superior productivity on the dual-core xeon 5160
Mentor Graphics Corporation has announced that Calibre nmDRC, Mentor's next generation physical verification tool, is fully supported and qualified on the new Intel Dual-Core Xeon 5160 Processor.
The Calibre nm Platform, which also includes solutions for layout vs.
schematic (LVS), parasitic extraction (xRC and xL), design for manufacturing (critical area analysis, recommended rules analysis, and via doubling) and design database back annotation to the place and route environment, will benefit UMC's customers for 65 nanometer processes.
Calibre nm Platform includes the new Calibre nmDRC with Hyperscaling.
This capability substantially reduces run times through advanced multi-threading methods, improved scalability on existing hardware and efficient use of CPUs.
In benchmark tests conducted at UMC, Hyperscaling resulted in a considerable reduction in run time.
"The Calibre nmDRC allows us to offer several benefits to our customers in the nanometer realm," said Ken Liou, director of the IP and Design Support division at UMC.
"With Hyperscaling our customers also realise substantial improvements in run time and increased productivity".
At 65nm, design signoff is no longer just DRC and LVS.
These basic components of physical verification are being augmented by an expansive set of yield analysis and critical feature identification capabilities as well as layout enhancements, and printability and performance validation, all of which Mentor addresses with the Calibre nm platform.
"We are excited that UMC and its customers are experiencing the tremendous value of the Calibre nm platform, including improved productivity and faster time-to-silicon," said Joe Sawicki, vice president and general manager for the design-to-silicon division at Mentor Graphics.
"Where others have struggled, Calibre continually evolves to answer the substantial changes in requirements for design sign-off".
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