Product category:
Stand-Alone Instruments
News Release from: Moritex Europe | Subject: Semiconductor Inspection System
Edited by the Electronicstalk Editorial
Team on 25 March 2004
IR-based system looks to improve IC
reliability
A novel infra-red-based system provides reliable inspection of semiconductor wafers and devices.
A novel infra-red-based system provides reliable inspection of semiconductor wafers and devices Comprising a high-performance 100W halogen-type light source, fibre-optic light guide, telecentric lens and IR-sensitive camera the new system provides a total solution for accelerating assurance of wafer construction accuracy and quality
This article was originally published on Electronicstalk on 16 Dec 2002 at 8.00am (UK)
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Offering a next generation alternative to near-infra-red systems that only "see" surface quality the new Moritex IR system provides subsurface inspection of semiconductor wafers and devices.
The combination of IR light source, operating at 1127nm, and the small depth of field provided by the proprietary IR telecentric lens enables accurate and rapid inspection of areas of interest within Si, GaAs, LiNbO3 and LiTaO3 wafers and devices.
Typical applications that will benefit from the new Moritex Semiconductor Inspection System include wafer-on-wafer alignment, SAW filter inspection, MEMS inspection, void inspection, FCB alignment and wafer inspection.
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