Latest news on Electronicstalk categorised by supplier
Oxford Instruments Plasma Technology
Address:
North End
Yatton
Bristol
BS49 4AP
UK
http://www.oxford-instruments.com
Our RSS feed for news from Oxford Instruments Plasma Technology
Request to receive our free email newsletter each week
Listing of all 9 news releases from Oxford Instruments Plasma Technology:
Process tool systems ordered for research complex
Nine systems will provide University of Southampton with leading-edge capabilities in the research and development of novel nanoelectronic, MEMS and photonic devices.
News from Oxford Instruments Plasma Technology (20 December 2007)
Dry etch deprocessing is enhanced
Plasma Accelerator delivers increased etching speeds, superior duplication rates, straightforward operation and low damage.
News from Oxford Instruments Plasma Technology ( 5 December 2007)
Dry etching system offers several tools in one
The PlasmalabuEtchEL provides the clean removal of polyimide, nitrides and oxides to reveal the underlying device structure for the desired analysis.
News from Oxford Instruments Plasma Technology ( 1 November 2007)
Collaboration targets nano-imprint lithography
Nano-imprint lithography is a versatile, cost-effective, flexible and high-throughput method for fabrication of down to and below 10nm structures.
News from Oxford Instruments Plasma Technology (13 September 2007)
Nano-scale tool maker appoints new MD
A provider of flexible tools and processes for the engineering of nanoscale structures and devices has appointed Andy Matthews as its new Managing Director
News from Oxford Instruments Plasma Technology (23 March 2007)
Complex MBE system demonstrates expertise
Oxford Instruments has delivered a twin V100 molecular beam epitaxy system to a prestigious customer in Asia.
News from Oxford Instruments Plasma Technology ( 2 February 2007)
Beacon recognises growth and innovation
Oxford Instruments Plasma Technology has been awarded Beacon status in recognition of its consistent growth and product innovation.
News from Oxford Instruments Plasma Technology (11 January 2007)
Delivery module enhances deposition tools
Oxford Instruments has developed a new TEOS delivery module for plasma-enhanced chemical vapour deposition of silicon dioxide in its PlasmalabSystem100 and PlasmalabSystem133 deposition tools.
News from Oxford Instruments Plasma Technology ( 5 January 2007)
Arsenic source speeds MBE growth
The new ECellAs valved arsenic effusion source or "cracker cell" for molecular beam epitaxy is designed for high performance MBE growth of arsenic-containing III-V materials.
News from Oxford Instruments Plasma Technology (13 November 2006)
