http://www.electronicstalk.com/news/oxr/oxr000.html Oxford Instruments Plasma Technology news releases on Electronicstalk en-gb Copyright (C)2008 Pro-Talk Ltd. All rights reserved. Wed, 08 Oct 2008 08:00:00 UT Wed, 08 Oct 2008 08:00:00 UT http://www.pro-talk.com/images/protalklogo90.gif http://www.pro-talk.com/ 90 79 Ion beam technology tool offerings are suitable for both R and D and batch production capabilities. Mon, 28 Jul 2008 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr109.html Nine systems will provide University of Southampton with leading-edge capabilities in the research and development of novel nanoelectronic, MEMS and photonic devices. Thu, 20 Dec 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr108.html Plasma Accelerator delivers increased etching speeds, superior duplication rates, straightforward operation and low damage. Wed, 05 Dec 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr107.html The PlasmalabuEtchEL provides the clean removal of polyimide, nitrides and oxides to reveal the underlying device structure for the desired analysis. Thu, 01 Nov 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr106.html Nano-imprint lithography is a versatile, cost-effective, flexible and high-throughput method for fabrication of down to and below 10nm structures. Thu, 13 Sep 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr105.html A provider of flexible tools and processes for the engineering of nanoscale structures and devices has appointed Andy Matthews as its new Managing Director Fri, 23 Mar 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr104.html Oxford Instruments has delivered a twin V100 molecular beam epitaxy system to a prestigious customer in Asia. Fri, 02 Feb 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr103.html Oxford Instruments Plasma Technology has been awarded Beacon status in recognition of its consistent growth and product innovation. Thu, 11 Jan 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr102.html Oxford Instruments has developed a new TEOS delivery module for plasma-enhanced chemical vapour deposition of silicon dioxide in its PlasmalabSystem100 and PlasmalabSystem133 deposition tools. Fri, 05 Jan 2007 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr101.html The new ECellAs valved arsenic effusion source or "cracker cell" for molecular beam epitaxy is designed for high performance MBE growth of arsenic-containing III-V materials. Mon, 13 Nov 2006 08:00:00 UT Oxford Instruments Plasma Technology http://www.electronicstalk.com/news/oxr/oxr100.html