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Product category: Power Supply ICs and Controllers
News Release from: PolarFab | Subject: Polar35
Edited by the Electronicstalk Editorial Team on 11 July 2005

Process gains bipolar and photodiode
options

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PolarFab has added complementary high-speed bipolar devices and multiwavelength photodiodes to its modular 0.35um Polar35 process.

PolarFab has added complementary high-speed bipolar devices and multiwavelength photodiodes to its modular 0.35um Polar35 process The Polar35 process, which also features 5V CMOS and a variety of passive devices, is ideal for a broad range of high-performance circuits for consumer, data communications and power management applications

The closely matched bipolar set features a low noise NPN device with an ft of 13GHz and a BVceo of 8V, and an isolated vertical PNP (IVPNP) device with an ft of 7GHz and BVceo of 8V.

The devices can be used in conjunction with 5V CMOS devices for a full c-BiCMOS device suite or in a c-bipolar flow, giving designers the flexibility to optimise circuit designs for low-noise and precision amplifiers, supervisory circuits and line drivers.

The integrated photodiodes with antireflective coating (patent-pending) optimised for 405, 650 and 780nm make the Polar35 process ideal for manufacturing photodetector integrated circuits (PDICs).

With its modular device and mask approach, the Polar35 process gives designers the ability to cost-effectively optimise the design for performance, and to re-use design IP across many product families.

The 5V CMOS devices with 0.35um design rules enable dense digital blocks for higher levels of integration and lower specific-on-resistance for smaller 5V switches.

A comprehensive set of passive devices supplements the CMOS, c-BiCMOS and c-bipolar device suites for analogue design.

Optional devices such as a 3kohm/square poly resistor for reduced die size and parasitics, a monolithically integrated high linearity/density poly-poly capacitor, and a Schottky diode further enhance the versatility and flexibility of the process.

The Polar35 process is manufactured on 200mm wafers.

The process is available with up to three layers of metal for additional customisation and space savings.

The Polar35 process is available with complete design support and documentation, including a Cadence process design kit (PDK), silicon proven ESD protection solutions, fully characterised device models, and a comprehensive design and layout manual.

A wide range of modelling platforms is available, including Spectre, PSpice and HSpice.

Designers can also manufacture prototypes using the Polar35 process through PolarShuttle, PolarFab's multiproject, fast track programme.

Pricing and delivery is dependent on customer requirements.

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