Product category:
AC/DC Power Supplies
News Release from: Photon Power Technology | Subject: IPOS series
Edited by the Electronicstalk Editorial
Team on 12 July 2006
Power supplies improve plasma processing
The IPOS series of DC magnetron power supplies for sputtering applications uses a superior arc suppression technology of typically less than 2us.
Photon Power Technology has announced the IPOS series of DC magnetron power supplies for sputtering applications Intended for use in industrial vacuum plasma processing, the IPOS series uses a superior arc suppression technology of typically less than 2us for better quality productivity in "hard-coat" glass/optical coatings
This article was originally published on Electronicstalk on 24 Mar 2006 at 8.00am (UK)
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Arc energy can be adjusted using the onboard 32bit digital control guaranteeing high accuracy and repeatability and remote control is via the RS232/RS485 interface options.
The IPOS range is available in power levels up to 20kW with various output characteristics dependent on the wave type required for the magnetron.
All have protection against overvoltage, short and open circuit conditions.
The IPOS series are suitable for single and dual magnetron sputtering systems and will also provide DC biasing power.
One of the latest techniques that the IPOS range are being used for is in VLSI, where the deposition of a copper film into deep hole and trenches is providing designed with improved flexibility.
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