Product category:
IC and Hybrid Processing Equipment
News Release from: Powerlase
Edited by the Electronicstalk Editorial
Team on 10 April 2008
Lasers boost semiconductor research
The Powerlase lasers will enable the development of the DPP source for lithography steppers, which are used for the fabrication of semiconductors.
Powerlase Starlase AO8 lasers have been purchased by the Extreme Ultraviolet Lithography System Development Association (EUVA) The lasers will be used by the EUVA for continued research into next generation semiconductor manufacturing
This article was originally published on Electronicstalk on 21 Jul 2006 at 8.00am (UK)
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Powerlase has entered into a partnership with the University of Central Florida to further the development of high-power laser produced plasma EUV sources.
The EUVA is working to perfect the use of discharge produced plasma (DPP) as a source for extreme ultraviolet lithography (EUVL).
The Powerlase lasers will enable the development of the DPP source for lithography steppers, which are used for the fabrication of semiconductors.
EUVL is the most likely technology to supersede current lithography techniques for high volume manufacture of semiconductors at 32nm and below.
DPP is one of two sources, along with laser produced plasma (LPP), capable of generating the 13.5nm light required for successful EUVL.
The Starlase lasers are the only commercial laser capable of producing the high-power, high-repetition source used to ignite DPP, creating the vital 13.5nm light and providing a more efficient manufacturing process than current lithography techniques.
Dr Samir Ellwi, Powerlase Vice President of Strategic Technology said: "The requirement for a viable EUVL technology is becoming increasingly important, as traditional techniques reach the end of their lifespan".
"As such, we are very pleased to begin a new phase of research with the EUVA".
"The continued partnership will ensure the deadline for the creation of a 32nm technique is achieved".
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