Renesas opts for model-based yield analysis

Renesas Technology has adopted model-based yield analysis technology from Ponte Solutions for critical area analysis and enabling reduction of yield-loss due to random defect-limited yield issues.

Renesas Technology has adopted model-based yield analysis technology from Ponte Solutions for critical area analysis and enabling reduction of yield-loss due to random defect-limited yield issues.

The two companies will work together on more advanced analysis, addressing systematic defect issues for 65nm technologies.

"We have investigated the capabilities of Ponte's model-based yield analysis technology", said Dr Nakaya, Executive General Manager at Renesas.

"We anticipate Ponte's potential to deliver a comprehensive solution for our yield analysis and enabling enhancement for defect-limited yield issues".

"Renesas has advanced nanometre technologies and we are very excited that Ponte's model-based yield analysis technology was chosen by Renesas in 90 and 65nm design nodes for pro-active analysis of silicon yield sensitivity, enabling yield enhancement at the design stage", said Alex Alexanian, Ponte's President and CEO.

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