NEC takes on optical proximity correction

Edited by the Electronicstalk editorial team Sep 17, 2004

NEC Electronics has adopted Synopsys Proteus optical proximity correction (OPC) software for 90nm production.

NEC Electronics has adopted Synopsys Proteus optical proximity correction (OPC) software for 90nm production.

"At the 90nm node, critical dimension (CD) accuracy becomes very important", said Hiroshi Sakuma, General Manager, Technology Foundation Development Operations Unit, NEC Electronics Corp.

"Proteus OPC software offers superior CD control and helps decrease turnaround times despite the increased complexity at 90 nanometres".

As process geometries continue to shrink to 90nm and below, the ability to efficiently optimise the application of OPC plays an increasingly critical role in accelerating time to yield.

In addition, OPC correction at smaller geometries requires significantly more processing time.

Proteus' unique architecture provides near-linear scalability, when using clusters of inexpensive Linux based central processing unit (CPUs) that allows customers to reduce turn-around-time.

Several leading-edge semiconductor companies have deployed Proteus to reduce mask synthesis turn-around-time from days to hours.

"Synopsys is focused on delivering comprehensive market leading DFM solutions to help our customers achieve manufacturable designs and accelerate their time to yield", said Edmund Cheng Vice President of Marketing for Design For Manufacturing (DFM) at Synopsys".

Proteus has become critical to ensuring the manufacturability of the most advanced semiconductor designs and to achieve the fastest time to results".