Product category:
Design and Development Software
News Release from: Synopsys
Edited by the Electronicstalk Editorial
Team on 19 April 2007
Collaboration on e-beam pattern
inspection tools
Companies are collaborating to enable faster, more accurate, more predictive optical proximity correction (OPC) model building for e-beam manufacturing at 45nm and beyond.
Synopsys and NanoGeometry Research, a provider of electron-beam pattern-inspection tools for microelectronics manufacturing, are collaborating to enable faster, more accurate, more predictive optical proximity correction (OPC) model building at 45nm and beyond This collaboration brings together advanced design for manufacturing (DFM) and metrology expertise to focus on building advanced "manufacturing aware" OPC and reticle enhancement technology (RET) lithography simulation models
This article was originally published on Electronicstalk on 19 Apr 2001 at 8.00am (UK)
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At 45nm and below, the process window becomes extremely small and a very tight error budget is required for accurate critical dimension (CD) control.
OPC models must accurately capture a wider scope of effects and process variations.
This requires a large sampling of physical measurements, including a wide range of critical 2D structures.
Synopsys and NGR are working with a joint customer, a large semiconductor manufacturer, to develop a common interface that works with both Synopsys' Proteus OPC tool and NGR's NGR2100 wafer inspection system.
"We believe the accuracy, stability, and time to modeling for OPC can be significantly improved by incorporating our wafer pattern data into Proteus modeling", stated Masahiro Yamamoto, CEO, NanoGeometry Research.
"By collaborating with Synopsys, the leader in DFM solutions, we can provide better predictive lithography models for our customers, helping them reduce the time required to develop a lithography process".
The interface that Synopsys and NGR are developing will allow Proteus modeling to automatically link to metrology data obtained from NGR's wafer inspection tool NGR2100.
With this new integration, Synopsys and NGR's mutual customers can quickly obtain a wide range of scanning electron microscope (SEM) measurements, and accurately overlay over the input layout data.
Proteus customers can achieve higher model accuracy, more predictive 2D models and process window models.
"Together, Synopsys and NGR are addressing the escalating need for accurate, high speed OPC modeling at the 45nm node", says Anantha Sethuraman, Synopsys' Vice President of Marketing, Design for Manufacturing.
"By addressing the complex technology issues our customers face at 45nm and beyond, this collaboration will help them achieve their model production and yield goals, thereby reducing their overall cost of ownership".
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