Product category:
Design and Development Software
News Release from: Synopsys | Subject: Sentaurus TCAD software
Edited by the Electronicstalk Editorial
Team on 24 April 2008
Etching simulation eases Toshiba's
research
Sentaurus Process and Device uses detailed physical models for simulating the fabrication process and electrical behaviour of a wide range of semiconductor devices.
Toshiba Semiconductor has adopted Synopsys' Sentaurus TCAD software for simulating etching and deposition in the development of next-generation devices As a result, Toshiba is able to reduce research and development time and trial production costs, while optimising next-generation device structures and yield, by quantitatively estimating process margin before and during volume production
This article was originally published on Electronicstalk on 19 Apr 2001 at 8.00am (UK)
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Sentaurus Process and Device uses detailed physical models for simulating the fabrication process and electrical behaviour of a wide range of semiconductor devices and is used in the research, development and optimisation of semiconductor technologies.
Sentaurus Topography extends these capabilities to physical etching and deposition.
"We have recognised for many years the importance of physical etching and deposition simulation in developing our process technologies".
"With TCAD being an essential part of our technology development, we have been able to reduce trial production cost and improve device yield", said Shigeru Komatsu, Toshiba Semiconductor's Chief Knowledge Officer.
"We are happy with Sentaurus Topography's performance, accuracy and integration with other Sentaurus TCAD tools and that's why we will be using it for our daily work in optimising and characterising next-generation devices".
The Sentaurus TCAD platform provides the ability to simulate detailed and realistic process structures for subsequent electrical analysis by Sentaurus Device.
In addition to the core etching and deposition models, Synopsys and Toshiba have also been collaborating to incorporate Toshiba's surface reaction kinetics modelling technology into Sentaurus Topography, allowing specific gas chemistries to be included as part of the simulation of topography modifying processes.
This advanced module is expected to be commercially available in the second half of 2008 as part of the Sentaurus Topography offering.
"Physical etching and deposition simulation is a key component in our roadmap for addressing advanced process technologies and device structure designs", said Terry Ma, Group Director, TCAD R and D at Synopsys.
"The advanced surface kinetics modeling technology we obtained from Toshiba represents a great collaboration, bringing key technological advances in physical modeling to the TCAD community".
Technology CAD (TCAD) refers to the use of computer simulation to model semiconductor processing and device operation.
TCAD provides insight into the fundamental physical phenomena that ultimately impact performance and yield.
Synopsys' DFM solution incorporates TCAD to provide a bi-directional link between manufacturing and design.
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