Product category:
Memory Devices and Modules
News Release from: Toshiba Electronics Europe
Edited by the Electronicstalk Editorial
Team on 02 February 2006
Japanese giants collaborate at 45nm
NEC Electronics, Sony and Toshiba have agreed to jointly develop system LSI process technologies for the 45nm generation.
NEC Electronics, Sony and Toshiba have agreed to jointly develop system LSI process technologies for the 45nm generation As applications in the digital consumer, mobile, and communications arenas evolve, there are greater requirements for advanced system LSI technologies to achieve higher performance and functionality, such as high-speed data processing, as well as lower power consumption and smaller chip dimensions
This article was originally published on Electronicstalk on 8 Nov 2004 at 8.00am (UK)
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The miniaturisation of process technology to meet these requirements is becoming increasingly critical and complex.
Meeting these requirements for leading edge system LSI process technology development requires a tremendous investment of development resources.
Many semiconductor companies worldwide are working together with the goal of more efficient development.
In February 2004, Sony and Toshiba announced their collaboration on 45nm system LSI process technology development, and have since proceeded with technology development based at Toshiba's Advanced Microelectronics centre in Yokohama, Japan.
The results of their efforts have been reported and recognised at industry symposia.
Likewise, NEC Electronics and Toshiba announced their agreement to jointly develop 45nm process technology in November 2005, and have been in discussions to decide the details of that collaboration.
As a result of today's agreement, NEC Electronics' 45nm development team will join Sony and Toshiba's ongoing work on 45nm technology development at the Advanced Microelectronics Centre.
By combining the three companies' development resources, NEC Electronics, Sony and Toshiba will raise development efficiency and further accelerate the pace of development, with the aim of establishing 45nm system LSI process technology quickly.
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