Name change follows Leica acquisition

Vistec Semiconductor is the new name for Leica Microsystems Semiconductor Equipment Division.

Vistec Semiconductor is the new name for Leica Microsystems Semiconductor Equipment Division.

The name change is a result of the acquisition of the Leica Microsystems Semiconductor Equipment Division by Golden Gate Capital in September 2005.

Vistec Semiconductor's innovative product portfolio includes inspection and review systems for the process control of wafers, mask metrology systems, and electron beam lithography systems.

These are used for production of microchips, in integrated optics and scientific and industrial research.

The new Vistec Semiconductor logo symbolises both core competencies: a wafer for inspection and the line under the name as the electron beam.

"The new name, a combination of 'visionary' and 'technologies', underlines the company goals: development of new - and future-oriented - technologies", explains Papken Der Torossian, Chairman of Vistec Semiconductor Systems.

With over 30 years of semiconductor industry experience, the company's know-how is the foundation for constant innovation.

State-of-the-art production facilities and constant product development enable success in emerging technologies and the dynamic chip technology market.

Der Torossian is confident: "We will continue our positive revenue growth under the new name and further strengthen our market positions in optical inspection and review, mask metrology and electron beam lithography systems".

Vistec Semiconductor consists of three divisions that feature leading technology used by the world's major semiconductor manufacturers and research institutes.

With over 500 employees around the world, the company has production facilities in Germany and the UK, and a distribution and service network in the USA, Japan, China, Singapore, Taiwan and Korea.

Vistec Semiconductor Systems, previously Leica Microsystems Semiconductor, is headquartered in Wetzlar, Germany.

A second German production facility - with a new clean room built last year - is located in Weilburg, where inspection and review systems, defect detection and classification systems and mask metrology systems are developed and produced.

Vistec Semiconductor Systems Division has a unique market position for high precision mask metrology systems, which are now in their fifth generation.

Vistec Electron Beam (previously Leica Microsystems Lithography), located in Jena, Germany, is a leader in electron beam direct writing.

The company also developed the variable shaped beam technology, and is the world first manufacturer of a line of electron beam systems with full 300mm writing capabilities.

Cutting edge measurement technology and production equipment assure system quality and constant enhancement.

Located in Cambridge (UK), Vistec Lithography (previously Leica Microsystems Lithography) is a leading supplier of high-resolution Gaussian beam lithography systems, which are used primarily in research.

A clean room assembly facility was built in Cambridge in 2001 to stay ahead of the increasingly stringent quality requirements of the semiconductor and nanotechnology industries.

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