Automated system monitors light

A Vistec Semiconductor Systems product story

Edited by the Electronicstalk editorial team Oct 10, 2007

Vistec's LMS IPRO4 is a fully automated mask metrology system, capable of measuring registration (overlay on reticles) as well as critical dimensions (CD) in transmitted and reflected light.

Vistec Semiconductor Systems' LMS IPRO4, fully automated mask metrology system recently passed the Customer Acceptance Test at AMTC (Advanced Mask Technology Center).

The system was installed and qualified within five weeks.

Vistec's LMS IPRO4 is a fully automated mask metrology system, capable of measuring registration (overlay on reticles) as well as critical dimensions (CD) in transmitted and reflected light.

It supports mask metrology for the 45nm technology node and beyond.

"In particular, the system's excellent long-term repeatability was most convincing".

"AMTC considers this a key parameter in the further development of mask technology for the 32nm chip generation and the system's upcoming application in 'double patterning' methods," Mathias Kamolz, Managing Director of AMTC, said.

"We are also very pleased with the software that has been newly developed by Vistec".

"We were not only in the position to meet all deadlines from R and D to the point of installation, our system even performed significantly better than the expected specifications we had agreed on," Dieter Adam, RandD Manager for the LMS IPRO Project, said.