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Vistec Electron Beam
Address:
Goeschwitzer Strasse 25
Jena
07745
Germany
http://www.vistec-semi.com
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Listing of all 5 news releases from Vistec Electron Beam:
Electron beam system has dual use
The industry proven SB351 can be used for mask writing as well as direct write applications.
News from Vistec Electron Beam (21 March 2007)
Shrinking life cycles good for e-beam lithography
Luncheon Symposium reports on conditions affecting the application of 'electron beam direct write' as a manufacturing technology for semiconductors.
News from Vistec Electron Beam (15 March 2007)
Ready for the 32nm technology node
Vistec Electron Beam has two new orders in hand for advanced electron optical columns of the SB3050 variable shaped beam system.
News from Vistec Electron Beam (13 July 2006)
E-beam system prepares for 32nm technology
A high-performance variable shaped electron beam system enables direct patterning for the 32nm technology node for R and D and prototyping.
News from Vistec Electron Beam (10 April 2006)
Budget e-beam system enables a quick turn
A universal cost-effective e-beam system for both direct write and mask making applications enables users to react flexibly to market demands.
News from Vistec Electron Beam (10 April 2006)
