http://www.electronicstalk.com/news/vio/vio000.html Vistec Electron Beam news releases on Electronicstalk en-gb Copyright (C)2008 Pro-Talk Ltd. All rights reserved. Thu, 02 Oct 2008 08:00:00 UT Thu, 02 Oct 2008 08:00:00 UT http://www.pro-talk.com/images/protalklogo90.gif http://www.pro-talk.com/ 90 79 The industry proven SB351 can be used for mask writing as well as direct write applications. Wed, 21 Mar 2007 08:00:00 UT Vistec Electron Beam http://www.electronicstalk.com/news/vio/vio104.html Luncheon Symposium reports on conditions affecting the application of 'electron beam direct write' as a manufacturing technology for semiconductors. Thu, 15 Mar 2007 08:00:00 UT Vistec Electron Beam http://www.electronicstalk.com/news/vio/vio103.html Vistec Electron Beam has two new orders in hand for advanced electron optical columns of the SB3050 variable shaped beam system. Thu, 13 Jul 2006 08:00:00 UT Vistec Electron Beam http://www.electronicstalk.com/news/vio/vio102.html A high-performance variable shaped electron beam system enables direct patterning for the 32nm technology node for R and D and prototyping. Mon, 10 Apr 2006 08:00:00 UT Vistec Electron Beam http://www.electronicstalk.com/news/vio/vio100.html A universal cost-effective e-beam system for both direct write and mask making applications enables users to react flexibly to market demands. Mon, 10 Apr 2006 08:00:00 UT Vistec Electron Beam http://www.electronicstalk.com/news/vio/vio101.html